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 | | Plasma Etching: An Introduction (Plasma : Materials Interactions) (Plasma : Materials Interactions) by Dennis M. Manos (Editor), Daniel L. Flamm (Editor) ISBN-10: 9780124693708 ISBN-10: 0-12-469370-9 ISBN-13: 9780124693708 ISBN-13: 978-0-12-469370-8 Hardcover 1989-07-28 Academic Press Find Lowest Price |
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Product Description Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods. | ||