For those with a TEM background it represents, perhaps, the definitive text for reflection methods.

There are two particularly attractive aspects of this book to be found in the closing pages. The first is an extensive set (ten) of appendices which contain much useful data along with five FORTRAM programs for interpreting spectra and modeling electron beam/specimen interaction. These have presumably been widely tested in the author's laboratory and their inclusion here is to be welcomed. The other feature, warmly welcomed by this reviewer, is the inclusion of a separate index of the materials used to illustrate the various facets of the reflection techniques. Also included as an Appendix is a chronological bibliography of REM, SREM and REELS covering the years 1975-1995. RHEED is presumably excluded as it is the most senior, and widely used, of the methods considered. This book is not one for those with a peripheral interest in RHEED, REM, SREM and REELS. Referring once again to the cover notes it is offered as an 'ideal guide for scientists and graduate students working on quantitative surface structure characterization using reflection electron techniques' and there is no doubt that this target audience will appreciate the publication of such a concise, authoritative and well written text in their chosen area of endeavor. For those with a TEM background it represents, perhaps, the definitive text for reflection methods and provides all the theoretical information necessary for a thorough appreciation of these techniques. At such a reasonable price for a very specialist text one would hope that it will soon find a place on the bookshelf of every electron microscopy unit with a practical need (or even aspirations) to carry out surface structure determination in the TEM or STEM. For those with a need for such a text this book fulfills all the claims made on its behalf. Dr. Wang is to be congratulated on writing a very accessible text. The book is thoroughly recommended.